Shanghai Nateng Instrument Co., Ltd
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Prism coupler
Prism coupler
Product details

The SPA series can provide accurate, non-contact, and non-destructive measurement of film thickness, suitable for polymer materials, silicon-based oxide films, and silicon-based glass films with film thickness ranging from 2-100 µ m. The method of generating interference fringes by changing the angle based on the interference fringes (VAMFO - Variable Angle Monochromatic Stripe Observation). For the measurement of thick film refractive index, monochromatic light is directly irradiated onto the measured sample, so that the minimum interference value of the light reflected back from the film surface will change, and the incident angle of the light will also change. In this technique, the film thickness is calculated from the position of the angle between the two minimum interference values. For this measurement condition - the film has two or more minimum interference values——The thickness of the film must be greater than the minimum threshing rate, usually 2 microns. The sample clamping machine uses vacuum to support the sample from the back, making installation easy and simple. Measurable types of thin films/substrates, including oxides, nitrides, dielectrics, polymers, or thin films of almost any transparent or semi transparent material on silicon substrates. Measurable film/substrate types: thin films of almost any transparent or semi transparent material on oxide, nitride, dielectric material, polymer, or silicon substrate.

The photothermal coefficient of the material film was measured using a SPA-4000 prism with a temperature control table. The photothermal coefficient of the material is defined as a function of the refractive index changing with temperature and can be used as an optical digital switch, Mach Zehnder spacing and cross type optical switch. These optical devices control the optical path by changing the temperature and play a key role in network communication. The most widely cited optical effect theory in this material is the Prod'homme theory

Product Features:

1. Measurement of refractive index/thickness/optical loss of thin films and waveguides

2. High resolution measurement of refractive index and film thickness

3. High precision measurement of bulk or substrate materials

4. Measurement of double-layer thin films (even at wavelengths of 1310 nm or 1550 nm with several~㎛ thickness)

5. Unrelated film/substrate combinations

6. No prior knowledge required, easy to operate.

7. High precision measurement of batch or substrate materials

8. Anisotropy/birefringence measurement (TE and TM capabilities)

9. Rapid characterization

10. Can be used for many lasers within the wavelength range (632.8nm~1550nm)


Technical indicators:

Measurement indicators

Range

Refractive index

Refractive index measurement range

1.0 to 2.45

Refractive index accuracy

0.001

Refractive index resolution

±0.0005

thickness

Thickness measurement range

0.4-20

Thickness accuracy

±0.5%

Thickness resolution

±0.01

Body material

Refractive index accuracy

0.0005

(Only measure refractive index)

Refractive index resolution

±0.0001

Thick film

Thickness measurement range

2-150

liquid

Refractive index measurement range

1.0 to 2.4

(Only measure refractive index)

Refractive index accuracy

± 0.0005

Thermal optical coefficient

Temperature testing range

Room temperature -150℃

Measurement of waveguide loss

Measurement limit

below


0.05dB/cm

3、 Application

Optical components of optical communication systems

-Optical switch

-Variable Optical Attenuator (VOA) for WDM (Wavelength Division Multiplexing)

-Low optical propagation loss

Plastic Optical Fiber (POF)

-Plastic Optical Fiber Amplifier (POFA) for Optical Communication

-High temperature polymer for waveguides

Temperature dependence

Properties of Polymers

-Study the chromium properties of polymers

-Information display and processing

-Storage materials


Nanodevices: MEMS, microelectronicsapplication area

:

The SPA series prism coupler can measure all types of films/substrates. Please refer to the table below for details.

These bulk and independent films are measurable.

Film type

Substrate type

Silicon nitride

Silicon nitride

silicon

silicon dioxide

ITO

Gallium arsenide

Silicon nitride oxide

sapphire

quartz

Low-K Films

Zinc sulfide

Glass

polyimide

titania

sapphire

polymerEpi

Garnet

GGG

Photoresist

Holographic gel


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