The SPA series can provide accurate, non-contact, and non-destructive measurement of film thickness, suitable for polymer materials, silicon-based oxide films, and silicon-based glass films with film thickness ranging from 2-100 µ m. The method of generating interference fringes by changing the angle based on the interference fringes (VAMFO - Variable Angle Monochromatic Stripe Observation). For the measurement of thick film refractive index, monochromatic light is directly irradiated onto the measured sample, so that the minimum interference value of the light reflected back from the film surface will change, and the incident angle of the light will also change. In this technique, the film thickness is calculated from the position of the angle between the two minimum interference values. For this measurement condition - the film has two or more minimum interference values——The thickness of the film must be greater than the minimum threshing rate, usually 2 microns. The sample clamping machine uses vacuum to support the sample from the back, making installation easy and simple. Measurable types of thin films/substrates, including oxides, nitrides, dielectrics, polymers, or thin films of almost any transparent or semi transparent material on silicon substrates. Measurable film/substrate types: thin films of almost any transparent or semi transparent material on oxide, nitride, dielectric material, polymer, or silicon substrate.
The photothermal coefficient of the material film was measured using a SPA-4000 prism with a temperature control table. The photothermal coefficient of the material is defined as a function of the refractive index changing with temperature and can be used as an optical digital switch, Mach Zehnder spacing and cross type optical switch. These optical devices control the optical path by changing the temperature and play a key role in network communication. The most widely cited optical effect theory in this material is the Prod'homme theory
Product Features:
1. Measurement of refractive index/thickness/optical loss of thin films and waveguides
2. High resolution measurement of refractive index and film thickness
3. High precision measurement of bulk or substrate materials
4. Measurement of double-layer thin films (even at wavelengths of 1310 nm or 1550 nm with several~㎛ thickness)
5. Unrelated film/substrate combinations
6. No prior knowledge required, easy to operate.
7. High precision measurement of batch or substrate materials
8. Anisotropy/birefringence measurement (TE and TM capabilities)
9. Rapid characterization
10. Can be used for many lasers within the wavelength range (632.8nm~1550nm)
Technical indicators:
Measurement indicators |
Range |
|
Refractive index |
Refractive index measurement range |
1.0 to 2.45 |
Refractive index accuracy |
0.001 |
|
Refractive index resolution |
±0.0005 |
|
thickness |
Thickness measurement range |
0.4㎛-20㎛ |
Thickness accuracy |
±0.5% |
|
Thickness resolution |
±0.01㎛ |
|
Body material |
Refractive index accuracy |
0.0005 |
(Only measure refractive index) |
Refractive index resolution |
±0.0001 |
Thick film |
Thickness measurement range |
2㎛-150㎛ |
liquid |
Refractive index measurement range |
1.0 to 2.4 |
(Only measure refractive index) |
Refractive index accuracy |
± 0.0005 |
Thermal optical coefficient |
Temperature testing range |
Room temperature -150℃ |
Measurement of waveguide loss |
Measurement limit |
below |
0.05dB/cm
3、 Application
Optical components of optical communication systems
-Optical switch
-Variable Optical Attenuator (VOA) for WDM (Wavelength Division Multiplexing)
-Low optical propagation loss
Plastic Optical Fiber (POF)
-Plastic Optical Fiber Amplifier (POFA) for Optical Communication
-High temperature polymer for waveguides
Temperature dependence
Properties of Polymers
-Study the chromium properties of polymers
-Information display and processing
-Storage materials
Nanodevices: MEMS, microelectronicsapplication area
:
The SPA series prism coupler can measure all types of films/substrates. Please refer to the table below for details.
These bulk and independent films are measurable. |
Film type |
|
Substrate type |
Silicon nitride |
Silicon nitride |
silicon |
silicon dioxide |
ITO |
Gallium arsenide |
Silicon nitride oxide |
sapphire |
quartz |
Low-K Films |
Zinc sulfide |
Glass |
polyimide |
titania |
sapphire |
polymerEpi |
Garnet |
GGG |
Photoresist |
Holographic gel |